SEMIXICON: High-Purity Quartz Components for Semiconductor, Plasma Etch & RTP Systems
SEMIXICON: High-Purity Quartz Components for Semiconductor, Plasma Etch & RTP Systems
Precision Quartz Wafer Handling & Custom Components
200mm & 150mm Quartz Wafer Trays – Compatible with 8-inch (200mm) and 6-inch (150mm) wafers for semiconductor processing.
Custom Quartz Parts – Machined with pedestals, recesses, holes, counterbores, and cavities for plasma tools, CVD, and diffusion furnaces.
Quartz Susceptor Holders – Designed for graphite susceptor integration in epitaxy and RTP systems.
High-Temperature Quartz for RTP & Annealing
Rapid Thermal Processing (RTP) Compatible – Engineered for fast ramp-up and uniform heating in AG Associates Heatpulse 8108/8800 systems.
1200°C Thermal Stability – High-purity quartz for post-implant annealing, oxide growth, and silicide formation.
Ultra-Pure Fused Quartz for Semiconductor Applications
Low Particulate Contamination – Ideal for semiconductor fabrication, MEMS, and power devices.
2.2 g/cm³ Density – High structural integrity for plasma ashers (Branson/IPC), etch tools, and CVD systems.
Precision-Machined Quartz Fixtures for Plasma & CVD
Optical-Grade Surface Finish – Custom Ra roughness for uniform thin-film deposition.
High Flatness Quartz Wafer Supports – Ensures uniform thermal contact in RTP and diffusion furnaces.
Complex Quartz Geometries – CNC-machined for plasma etchers, LPCVD, and PECVD systems.
Key Applications in Semiconductor Manufacturing
✅ Post-implant annealing (RTA)
✅ Oxide & nitride film growth (Thermal CVD)
✅ Reflow processes (BPSG, PSG)
✅ Silicides & metal alloy formation (TiSi₂, CoSi₂, NiSi)
✅ Plasma ashing & etching (Branson/IPC, OEM systems)
Compatible With:
✔ AG Associates Heatpulse 8108 & 8800 RTP Systems
✔ Branson/IPC Plasma Ashers
✔ Plasma Etch, CVD, and Diffusion Furnace Tools
📩 Get a Custom Quartz Solution Today!
✉ Email: sales@semixicon.com
🌐 Website: www.semixicon.com
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